mask topography

A new technique of mask division for improving the sharpness of mask edge is put forward, which can be used to solve the lowpass filtering problem of the reduction lens in the system of mask fabrication with electrically addressed spatial light modulators.

针对电寻址空间光调制器制作灰度掩模过程中,精缩透镜的低通滤波特性导致灰度掩模边缘锐度下降的问题,提出了掩模分形技术。